May 16 is the “International Day of Light” defined by UNESCO. ASML China official wrote in a WeChat push “Innovation, let Moore’s Law shine again”. ASML China emphasized that in the past 15 years, Moore’s Law is still in effect and in good condition, and it will continue to maintain momentum in the next decade or even longer.
ASML confidently states that “In terms of components, the current technological innovation is sufficient to advance the chip process to at least 1 nanometer node, including gate-all-around FETs (gate-all-around FETs), nanosheet FETs, forksheet FETs and complementary FETs”.
In addition, improvements in lithography system resolution (expected to shrink by a factor of 2 every 6 years or so) and edge placement error (EPE) as a measure of accuracy will further drive chip size reductions.
It is understood that nanometers will enter the era of Amy, and TSMC, Intel, etc. have all formulated an ambitious early roadmap for the Amy process. Perhaps, the reason why technological innovation is so precious is that it will not be overthrown by difficulties.
