Home Business The unit price exceeds 300 million US dollars! Intel won the first batch of second-generation High-NA EUV lithography machine 2nm will be the first to mass production

The unit price exceeds 300 million US dollars! Intel won the first batch of second-generation High-NA EUV lithography machine 2nm will be the first to mass production

by admin

The unit price exceeds 300 million US dollars! Intel won the first batch of second-generation High-NA EUV lithography machine 2nm will be the first to mass production

On January 19, the global lithography machine giant ASML announced its latest financial report, and its fourth quarter 2021 and 2021 full-year results both hit record highs and were better than expected.

ASML also announced that in the first quarter of 2022, its second-generation high numerical aperture (High-NA) lithography machine TWINSCAN EXE: 5200 won the first order, which also means that this lithography machine can be used for 2nm chip manufacturing is expected to be delivered in 2024.

Revenue in 2021 is 18.6 billion euros, with a gross profit margin of 52.7%. According to the financial report, ASML’s revenue in the fourth quarter of 2021 was 4.986 billion euros, with a net profit of 1.774 billion euros and a gross profit margin of 54.2%. New orders amounted to EUR 7.050 billion.

For the full year of 2021, the revenue will reach 18.611 billion euros (a year-on-year increase of 35%), the net profit will be 5.883 billion euros, and the gross profit margin will be 52.7%. New orders for the whole year of 2021 will be 26.240 billion euros, half of which will come from EUV lithography machines.

Peter Win said that ASML received an order for TWINSCAN EXE:5000 in the fourth quarter of 2021. Since 2018, ASML has received four orders for TWINSCAN EXE:5000.

It is known that,EXE:5000 is mainly for 3nm process, and the second generation 0.55 NA EUV lithography machine TWINSCAN EXE:5200 will be used for 2nm process production.

In 2021, 42 EUV lithography systems were shipped. In 2021, ASML’s revenue from lithography systems was 13.653 billion euros, and a total of 287 lithography systems were sold.

In terms of specific sales, 42 EUV lithography systems contributed about 6.3 billion euros, accounting for 46% of sales; 81 ArFi lithography systems, accounting for 36% of sales; 131 ArF lithography systems, accounting for sales 10%; 33 i-Line lithography systems, accounting for 1% of sales.

The unit price exceeds 300 million US dollars! Intel won the first batch of second-generation High-NA EUV lithography machine 2nm will be the first to mass production

From the end use of the lithography systems sold, 70% are used in logic semiconductor processes and 30% are used in the manufacture of memory chips.

From the point of view of the final shipment place of the lithography system,China‘s Taiwan region contributed as much as 44% of sales, South Korea accounted for 35%, and mainland China accounted for 16%.

Peter Wen said: “The growth of EUV shipments for ASML in 2021 is not high, mainly due to the impact of the logistics center and supply chain issues we announced in the third quarter. But this is entirely driven by the installation of EUV lithography machines and The underlying revenue such as upgrades compensates, especially the productivity upgrades that we are able to offer to our customers. Our customers are in dire need of the additional capacity and there is a high demand. This segment has sales of 1.5 billion euros. In what we call the productivity enhancement package Driven by this, a large number of options have been installed, providing customers with additional wafer capacity.”

The unit price exceeds 300 million US dollars! Intel won the first batch of second-generation High-NA EUV lithography machine 2nm will be the first to mass production

In the DUV business, ASML said the XT:860N has been delivered to its first customer by the end of 2021. This KrF system offers better performance and lower cost. In 2022, with the introduction of NXT:870, ASML will add KrF to the NXT platform, enabling it to take a major step forward in terms of productivity and cost of ownership, building on existing experience on this platform in ArFi and ArFDry .

In the application business, the first eScan1100 multi-beam inspection system, which is designed for high-volume production, is scheduled to be delivered in the next few weeks. With 25 beams (5×5), the eScan1100 is expected to provide a 15x increase in throughput compared to a single e-beam inspection tool for targeted in-line defect inspection applications.

The unit price exceeds 300 million US dollars, and TWINSCAN EXE:5200 has received the first order

Since the extreme ultraviolet wavelength (13 nm) used in EUV lithography systems is significantly reduced compared to DUV immersion lithography systems (193 nm), the multi-pattern DUV steps can be replaced with single exposure EUV steps. It can help chip manufacturers continue to advance to 7nm and below more advanced process technology, while further improving efficiency and reducing exposure costs.

Since the official launch of ASML’s first mass-produced EUV lithography machine in 2017, Samsung’s 7nm/5nm process, TSMC’s second-generation 7nm process and 5nm process mass production all rely on 0.55 numerical aperture EUV lithography machine for production.

At present, leading wafer manufacturers such as TSMC, Samsung, and Intel are also investing heavily in more advanced 3nm and 2nm technologies to meet the needs of advanced chips such as high-performance computing. The realization of the 3/2nm process needs to rely on ASML’s new generation of high numerical aperture (High-NA) EUV lithography machine EXE: 5000 series.

The high-NA EUV lithography machine currently under development by ASML is an iteration of the EUV lithography system based on a 0.33 NA lens with a 0.55 NA lens and a resolution of 8 nanometers. The 0.33 NA lens of the EUV lithography system has a resolution of 13 nanometers, enabling chipmakers to produce chips on more advanced processes of 3/2nm and below with lower cost and higher production efficiency for pattern exposure.

However, the cost of the 0.55 NA EUV lithography system is also higher than that of the first-generation EUV lithography machine. According to KeyBanc, a 0.55 NA EUV lithography system is expected to cost $318.6 million, compared with $153.4 million for EUV lithography systems currently shipping.

It is worth noting that ASML President and CEO Peter Wen revealed that in the fourth quarter of 2021, among the new orders valued at 7.050 billion euros received by ASML, the order amount of 0.55 NA EUV lithography system and 0.55 NA EUV lithography system. reached 2.6 billion euros.

Peter Win said that ASML received an order for TWINSCAN EXE:5000 in the fourth quarter of 2021. Since 2018, ASML has received four orders for TWINSCAN EXE:5000. It is understood that EXE:5000 is mainly for the 3nm process. The second-generation 0.55 NA EUV lithography machine TWINSCAN EXE: 5200 will be used in the production of 2nm process.

Peter Win revealed that in early 2022, ASML has received its first order for the next-generation TWINSCAN EXE:5200, marking another step in ASML’s path to introducing 0.55 NA EUV lithography.

According to ASML’s roadmap, the TWINSCAN EXE:5000 will ship in the second half of this year and can produce 185 wafers per hour. The TWINSCAN EXE:5000 will be shipped by the end of 2024, and can manufacture more than 220 wafers per hour.

The unit price exceeds 300 million US dollars! Intel won the first batch of second-generation High-NA EUV lithography machine 2nm will be the first to mass production

At the “Intel Accelerates Innovation: Process Technology and Packaging Technology Online Conference” at the end of July 2021,Intel has announced that it will mass-produce the 20A process (equivalent to TSMC’s 2nm process) in 2024, and revealed that it will be the first to obtain the industry’s first High-NA EUV lithography machine. The first order for ASML TWINSCAN EXE:5200 lithography machine came from Intel.

Martin van den, president and chief technology officer of ASML, said that Intel’s vision and early commitment to ASML’s High-NA EUV technology is a testament to the relentless pursuit of Moore’s Law. Compared to current EUV systems, ASML’s extended EUV roadmap provides continuous improvements at lower cost, time-frame and architecture, which will drive the chip industry for the next decade.

For Intel, getting the ASML TWINSCAN EXE: 5200 lithography machine first is the key to Intel’s determination that its process technology can surpass TSMC and Samsung to return to the leading position.

However, TSMC and Samsung should also be competing for Hight NA EUV lithography machines before. At the beginning of October last year, Samsung announced at the beginning of October that it would mass-produce the 3nm process in the first half of 2022, and plans to lead TSMC to produce 2nm in 2025.

To this end, it is reported that Samsung is also urgently snapping up a Hight NA EUV lithography machine and asking ASML to directly pull it to the Samsung factory for testing.

In addition, TSMC also announced at the previous legal meeting that in 2025, TSMC’s 2nm process will be the most advanced technology in terms of density and performance.

Berlin factory fire won’t affect 2022 shipments

On January 3 this year, a fire broke out in a factory of ASML in Berlin, Germany. The fire was extinguished that night and no one was injured in the fire.

According to the data, ASML’s Berlin factory is a parts factory, which mainly produces parts required for DUV and EUV lithography machines such as wafer tables, mask chucks and mirror modules.

Subsequently, ASML stated on its official website that the production of DUV lithography machine parts was partially interrupted after the fire, but production has resumed soon, and they are expected to remediate in a way that will not affect DUV lithography machine production and revenue plans. In addition, the fire in the Berlin factory also affected the production area of ​​a component of the EUV lithography machine. The recovery plan is still in progress. They have decided to take relevant measures, which will have a potential impact on EUV lithography machine customers, output plans and services. drop to lowest.

At this earnings conference, Peter Wen said that the fire at the Berlin factory was extinguished within a few hours, but there were still significant losses. For the DUV lithography machine, although there are some initial disturbances, it does not think there will be any impact on the production in 2022. In addition, the production of wafer clamps required for EUV lithography machines, a very complex but very important module, has been affected. But through our efforts, we believe that we can deal with this situation, and we don’t think we will see a big impact on the production of our EUV lithography machine in 2022.

Revenue in the first quarter of 2022 is about 3.3-3.5 billion euros

ASML also announced its financial forecast for the first quarter of 2022, with an estimated net revenue of about 3.3 billion to 3.5 billion euros and a gross profit margin of about 49%. ASML expects R&D costs to be around EUR 760 million in the first quarter and SG&A costs to be around EUR 210 million.

“The lower guidance for net sales in the first quarter is due to the high volume of rapid shipments that will shift projected revenues of approximately EUR 2 billion from the first quarter to subsequent quarters,” said Peter Wen, ASML President and CEO. The delay in express shipments until the first quarter of this year confirmed an amount of approximately 300 million euros.”

“Customer demand for lithography systems exceeds our production capacity. Strong end-market demand puts pressure on our customers to increase wafer yield. To support our customers, we provide them with A high productivity upgrade solution and shortened production cycle times in our fab to deliver more lithography systems. One way to reduce lead time is by skipping some testing at our fab through a fast shipping process. Final testing and Formal acceptance will take place at the customer site and typically the acceptance process takes several weeks (sometimes three to four weeks). This will result in a delay in the recognition of revenue for these shipments until the customer formally accepts it, but it does provide our customers with more Get the opportunity to increase wafer output capacity early.” Peter Wen further explained.

Revenue expected to grow 20% in 2022

For the performance expectations for the full year of 2022, ASML is also optimistic that it will maintain a year-on-year revenue growth of about 20%.

“2022 is going to be a good year. Compared to 2021, we’re expecting growth of about 20%. That’s a good number because you have to take into account that we’re also going to have some ‘fast shipping by the end of 2022’ ‘, causing some revenue to be shifted to 2023 recognition. We currently believe that approximately six EUV systems will be shipped in expedited shipments by the end of 2020. If the delayed recognition revenue is added, then 2022 revenue will increase by 25% year-on-year left or right,” said Peter Win.

55 EUV lithography machines to be shipped in 2022

For EUV lithography machine shipments in 2022, ASML expects to reach 55 units. As mentioned earlier, revenue recognition for about 6 of these units will be delayed until 2023. In addition, shipments of EUV lithography machines are expected to grow to 60 units in 2023.

In terms of DUV lithography machine business, ASML believes that DUV lithography machine shipments will be particularly strong in 2022. Because it touches all industries, including memory and logic chip manufacturing. In particular, the continued shortage of chips has led to strong demand for DUV lithography machines.

Peter Wen predicts, “Our DUV lithography machine business may grow by about 20% in 2022 compared to 2021.”

In addition, in terms of installed base options, Peter Wen also said that there will be a very strong growth in 2021, and customer demand for installed base options has increased a lot to add more wafer production. ASML still expects this to remain in 2022. will grow by about 10%.


#Intel#CPU processor#Lithography#2nm

Original link: Xinzhixun
Responsible editor: above text Q

You may also like

Leave a Comment

This site uses Akismet to reduce spam. Learn how your comment data is processed.

This website uses cookies to improve your experience. We'll assume you're ok with this, but you can opt-out if you wish. Accept Read More

Privacy & Cookies Policy