The unit price exceeds 1.9 billion Intel’s world‘s first order for ASML’s most advanced EUV lithography machine: performance greatly increased
The latest news on January 19,Intel announced the first order for the ASML TWINSCAN EXE:5200 lithography machine.
The TWINSCAN EXE:5200 is ASML’s high NA (numerical aperture) EUV lithography machine with a throughput of over 220 wafers per hour (wph).
From the roadmap, EXE:5200 is expected to be put into use at the end of 2024 at the earliest, and will be used in large-scale production of advanced chips in 2025.
In fact, four years ago, Intel was the first company to place an order for ASML’s first-generation high-NA (0.55 NA) lithography machine EXE: 5000. However, the current 7nm and 5nm chips are not their production, but 0.33NA EUV lithography machines.
Compared with the 0.33NA lithography machine, the resolution of 0.55NA has been upgraded from 13nm to 8nm, which can expose more complex integrated circuit patterns faster and better, breaking the limit of 32nm to 30nm spacing for single patterning of 0.33NA.
It is expected that the first-generation high-NA lithography machine EXE: 5000 will be the first to be used in the 3nm node. As for EXE: 5200, according to Intel’s process roadmap,At least 20A or 18A in 2025, which is 5nm and 5nm+。
Previously, an ASML spokesperson told the media that higher lithography resolution would allow the chip to shrink by a factor of 1.7 while increasing the density by a factor of 2.9. In the future, more advanced processes than 3nm will be extremely dependent on high NA EUV lithography machines.
In the end, I have to say that Intel can grab the first order, in addition to the close cooperation with ASML, of course, it is also because of “money capabilities”. Gartner analyst Alan Priestley said that the unit price of the 0.55NA next-generation EUV lithography machine will double to 300 million US dollars (about 1.9 billion yuan).
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Responsible editor: Wan Nan
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